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authorprashantsinalkar2017-10-10 12:27:19 +0530
committerprashantsinalkar2017-10-10 12:27:19 +0530
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+ rootD = 0.18 micro-m/h^-2
+Temperature at diffusion should be carried out= 1100 Celsius
+The temperature value was choosen by determing the value of T agains root(D) in the figure of Diffusivity of acceptor impurities in silicon versus T \ No newline at end of file