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| author | prashantsinalkar | 2017-10-10 12:27:19 +0530 |
|---|---|---|
| committer | prashantsinalkar | 2017-10-10 12:27:19 +0530 |
| commit | 7f60ea012dd2524dae921a2a35adbf7ef21f2bb6 (patch) | |
| tree | dbb9e3ddb5fc829e7c5c7e6be99b2c4ba356132c /1040/CH7/EX7.1.a | |
| parent | b1f5c3f8d6671b4331cef1dcebdf63b7a43a3a2b (diff) | |
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initial commit / add all books
Diffstat (limited to '1040/CH7/EX7.1.a')
| -rw-r--r-- | 1040/CH7/EX7.1.a/Chapter7_Ex1_a.sce | 43 | ||||
| -rw-r--r-- | 1040/CH7/EX7.1.a/Chapter7_Ex1_a_Output.txt | 4 |
2 files changed, 47 insertions, 0 deletions
diff --git a/1040/CH7/EX7.1.a/Chapter7_Ex1_a.sce b/1040/CH7/EX7.1.a/Chapter7_Ex1_a.sce new file mode 100644 index 000000000..fae0a8e8c --- /dev/null +++ b/1040/CH7/EX7.1.a/Chapter7_Ex1_a.sce @@ -0,0 +1,43 @@ +//Harriot P.,2003,Chemical Reactor Design (I-Edition) Marcel Dekker,Inc.,USA,pp 436.
+//Chapter-7 Ex7.1.a Pg No.260
+//Title:Overall Reaction Rate Coefficient and Percent Resistance
+//===========================================================================================================
+clear
+clc
+//INPUT
+k2=8.5;//Reaction rate constant (L/mol-sec)
+T=50;//Reaction condition temperature(°C)
+P=2;//Reaction Pressure (atm)
+H_O2=8*10^4;// Solubility (atm/mol fraction)
+F=17000//Feed rate (L/hr)
+C_B_feed=1.6;//Feed concentration(M)
+C_B_product=0.8;//Product concentration(M)
+k_L_a=900;//Liquid film mass transfer coefficient(hr-1)
+k_g_a=80;//Gas film mass transfer coefficient(mol/hr L atm)
+Epsilon=0.1;//Porosity
+
+
+//CALCULATION
+H_O2_conv=H_O2*18/1000;// Convert (atm L/mole O2)
+k_L_a_by_H=k_L_a/H_O2_conv;
+reaction_resistance=H_O2_conv/(k2*C_B_product*(1-Epsilon)*3600);
+Kg_a=1/((1/k_g_a)+(1/k_L_a_by_H)+(reaction_resistance));//Refer equation7.10
+gasfilm_resistance_per=((1/k_g_a)/(1/Kg_a))*100;
+liq_film_resistance_per=((1/k_L_a_by_H)/(1/Kg_a))*100;
+reaction_resistance_per=((reaction_resistance)/(1/Kg_a))*100;
+
+//OUTPUT
+// Console Output
+mprintf('\nThe percentage gas-film resistance : %0.1f%%',gasfilm_resistance_per);
+mprintf('\nThe percentage liquid-film resistance: %0.1f%%',liq_film_resistance_per);
+mprintf('\nThe percentage chemical reaction resistance: %0.1f%%',reaction_resistance_per);
+
+// File Output
+fid= mopen('.\Chapter7-Ex1-a-Output.txt','w');
+mfprintf(fid,'\nThe percentage gas-film resistance: %0.1f%%',gasfilm_resistance_per);
+mfprintf(fid,'\nThe percentage liquid-film resistance: %0.1f%%',liq_film_resistance_per);
+mfprintf(fid,'\nThe percentage chemical reaction resistance: %0.1f%%',reaction_resistance_per);
+mclose(fid);
+//===================================================END OF PROGRAM======================================================
+
+
diff --git a/1040/CH7/EX7.1.a/Chapter7_Ex1_a_Output.txt b/1040/CH7/EX7.1.a/Chapter7_Ex1_a_Output.txt new file mode 100644 index 000000000..d58fc7cea --- /dev/null +++ b/1040/CH7/EX7.1.a/Chapter7_Ex1_a_Output.txt @@ -0,0 +1,4 @@ +
+The percentage gas-film resistance: 0.7%
+The percentage liquid-film resistance: 95.4%
+The percentage chemical reaction resistance: 3.9%
\ No newline at end of file |