blob: 6fb2bda9bc1365ad20ea249152114425897a9dc8 (
plain)
1
2
3
4
5
6
7
8
9
10
11
12
13
14
15
16
17
18
19
20
21
22
23
24
25
26
27
28
29
30
31
32
33
34
35
36
37
38
39
40
41
42
43
44
45
46
47
48
49
50
51
52
53
54
55
56
57
|
Emitter Coupled Pair
VCC 1 0 5v
VEE 2 0 0v
RCP 1 11 10k
RCN 1 21 10k
VBBP 12 0 3v AC 1
VBBN 22 0 3v
IEE 13 2 0.1mA
Q1 11 12 13 M_NPN AREA=8
Q2 21 22 13 M_NPN AREA=8
.DC VBBP 2.75v 3.25001v 10mv
.PRINT V(21) V(11)
.MODEL M_NPN nbjt level=2
+ title TWO-DIMENSIONAL NUMERICAL POLYSILICON EMITTER BIPOLAR TRANSISTOR
+ * Since, we are only simulating half of a device, we double the unit width
+ * 1.0 um emitter length
+ options defw=2.0u
+
+ *x.mesh w=2.5 n=5
+ x.mesh w=2.0 h.e=0.05 h.m=0.2 r=1.5
+ x.mesh w=0.5 h.s=0.05 h.m=0.1 r=1.5
+
+ y.mesh l=-0.2 n=1
+ y.mesh l= 0.0 n=5
+ y.mesh w=0.10 h.e=0.002 h.m=0.01 r=1.5
+ y.mesh w=0.15 h.s=0.002 h.m=0.01 r=1.5
+ y.mesh w=0.35 h.s=0.01 h.m=0.2 r=1.5
+ y.mesh w=0.40 h.e=0.05 h.m=0.2 r=1.5
+ y.mesh w=0.30 h.s=0.05 h.m=0.1 r=1.5
+
+ domain num=1 material=1 x.l=2.0 y.h=0.0
+ domain num=2 material=2 x.h=2.0 y.h=0.0
+ domain num=3 material=3 y.l=0.0
+ material num=1 polysilicon
+ material num=2 oxide
+ material num=3 silicon
+
+ elec num=1 x.l=0.0 x.h=0.0 y.l=1.1 y.h=1.3
+ elec num=2 x.l=0.0 x.h=0.5 y.l=0.0 y.h=0.0
+ elec num=3 x.l=2.0 x.h=3.0 y.l=-0.2 y.h=-0.2
+
+ doping gauss n.type conc=3e20 x.l=2.0 x.h=3.0 y.l=-0.2 y.h=0.0
+ + char.l=0.047 lat.rotate
+ doping gauss p.type conc=1e19 x.l=0.0 x.h=5.0 y.l=-0.2 y.h=0.0
+ + char.l=0.094 lat.rotate
+ doping unif n.type conc=1e16 x.l=0.0 x.h=5.0 y.l=0.0 y.h=1.3
+ doping gauss n.type conc=5e19 x.l=0.0 x.h=5.0 y.l=1.3 y.h=1.3
+ + char.l=0.100 lat.rotate
+
+ method ac=direct itlim=10
+ models bgn srh auger conctau concmob fieldmob
.OPTIONS ACCT BYPASS=1
.END
|